R&D, 少量生產(chǎn)用立式爐:
- High performance processing for R&D
- Mini Batch, max 25 wafers batch processing
- 2 to 8 inch and 300mm wafer size are available
- Equipped with LGO heater to realize high temperature performance as mass-production equipment
- Equipped with limited function simple control system
Outer dimension | W1500×D1000×H2100mm | |
---|---|---|
Heater | LGO heater | |
Flat zone length | 160 to 250mm | |
Wafer size | to 8inch | |
Batch size | to 25wafers | |
Controller | Model 880 | |
Option | Forced-cooling system, N2 load lock, 25 to 150 wafers of processing (VF-2000) |