感應(yīng)加熱式高速升降溫爐:
- 4 to 8 inch wafer size is available
- Low cost system by manual susceptor transfer
- Upper & lower cross lamp structure and soaking furnace improved the uniformity of in-plane temperature
- Vacuum designed quartz tube enables accurate gas substitution and process at vacuum pressure
- Equipped with operator friendly high performance control system
Outer dimension | W1300×D1300×H1850mm | |
---|---|---|
Operation temperature | 400 to 1200℃ | |
Heat up rate | Max.200℃/sec | |
Lamp layout | Upper & lower cross lamp arrays | |
Number of control zone | 6 | |
Wafer size | 4 to 8 inch | |
Wafer transfer | manual | |
Controller | Model RSC 1000 | |
Option | Vacuum system, Clean bench |